Precursors & Chemicals
AsiaGas delivers a comprehensive portfolio of precursors and specialty chemicals for CVD/ALD deposition, wafer cleaning, etching, and surface preparation. Designed for semiconductor, display, and electronics manufacturing, our materials are backed by scalable capacity, flexible packaging, and strict quality standards.
We know that process materials directly influence yield, reliability, and device performance. That’s why our solutions combine:
- Quality assurance & full traceability
- Reliable logistics and scalable supply
- Responsive technical support from lab to fab
Precursors for CVD/ALD
We supply a wide range of silicon-based (Si) and metal-organic (MO) precursors for thin-film deposition processes such as chemical vapor deposition (CVD) and atomic layer deposition (ALD).
Each precursor is supported by proven field performance, scalable capacity, and rigorous quality control trusted by leading global manufacturers.
Si Series
HCDS
CI₃SiSiCI₃
Hexachloro disilane
TEOS
Si(OEt)₄
Tetraethyl orthosilicate
TSA
(SiH₃ )₃N
Trisilylamine
BDEAS
(Et₂N)₂SiH₂
Bis(diethylamino)silane
BTBAS
(tBu₂N)₂SiH₂
Bis(t-Butylamino)silane
3DMASi
SiH(NMe₂)₃
Tris(dimethylamino)Silane
DIPAS
C₆H₁₇NSi
Diisopropylaminosilane
4MS
(CH₃)₄Si
Tetramethylsilane
Metal Series
TDMAT
[(CH₃)₂N]₄Ti
Tetrakis(dimethylamido) titanium(IV)
TiCl₄
TiCI₄
Titanium chloride
TEMAHf
Hf(NEtMe)₄
Hafnium tetrakis(ethy methylamido)
TEMAZr
Zr(NCH₃C₂H₅)₄
Tetrakis(ethylmethylamido)zirconium(IV)
TMA
Al(CH₃)₃
Aluminium trimethy
PDMAT:
C₁₀H₃₀N₅Ta
Pentakis(dimethylamino)tantalum(V)
ССТВА
C₁₂H₁₀Co₂O₆
(3,3-Dimethyl-1-butyne)dicobalt hexacarbonyl
CpCo(CO)₂
C₅H₅Co(CO)₂
Dicarbonylcyclopentadienyl cobalt(I)
Specialty Chemicals for Semiconductor & Electronics
AsiaGas provides a broad portfolio of electronic-grade and specialty chemicals that support wafer cleaning, etching, surface treatment, and device fabrication. Each chemical is carefully sourced, packaged, and tested to meet the most stringent industry specifications.
