Semiconductors Manufacturing
Specialty Gases and Chemicals for Advanced Semiconductor Manufacturing
AsiaGas supplies a comprehensive portfolio of specialty gases for semiconductor manufacturing — from ultra-pure laser and dopant gases to process support gases and chemical mixtures. Our products enable critical steps such as photolithography, etching, chamber cleaning, deposition, doping, and wet processing, meeting the performance and reliability needs of advanced logic, memory, and foundry production.
Photolithography Gases
Photolithography defines transistor features and circuit patterns.
AsiaGas delivers ultra-pure laser gas mixtures with exceptional beam stability and minimal optical absorption, ensuring precise exposure in DUV and EUV lithography at sub-5 nm nodes.
- Applications: EUV/DUV exposure, optical path purging, scanner calibration
- Products: F₂/Kr/Ne • Kr/Ne • Ar/Xe/Ne • F₂/Ar/Ne • He/N₂ (1.2%) • O₂/He (0.5%)
Etching Gases
Etching selectively removes material layer by layer to create device patterns.
AsiaGas supplies high-purity gases for plasma etch tools, enabling critical dimension control and low plasma damage.
- Applications: Etching of SiO₂, Si₃N₄, low-k dielectrics, and metals
- Products: CF₄ • C₂F₆ • C₄F₈ • C₆F₆ • CHF₃ • CH₂F₂ • CO • C₅F₈
Chamber Cleaning Gases
Clean chambers are essential for uptime and process stability. AsiaGas offers reactive gases that remove deposition by-products efficiently, reduce maintenance cycles, and improve yield.
- Applications: In-situ clean, dry strip, residue removal
- Products: NF₃ • SF₆ • ClF₃ • CO₂ • C₄F₈ • COS • He • N₂
Deposition & Diffusion Gases
Deposition and diffusion form conductive, dielectric, and barrier layers on wafers. AsiaGas provides ultra-pure precursors and reactants for uniform, defect-free film growth and controlled dopant integration.
- Applications: Thermal CVD, PECVD, diffusion furnaces
- Products: SiH₄ • GeH₄ • H₂Se • NH₃ • NO • BCl₃ • Mixtures of GeH₄, PH₃, SiH₄, BCl₃ (with MG)
Doping & Ion Implantation Gases
Doping adjusts semiconductor electrical properties by introducing controlled impurities. AsiaGas dopant gases support precise carrier concentration control for CMOS, DRAM, and 3D NAND.
- Applications: N-/P-type doping, source/drain engineering, junction formation
- Products: PH₃ • AsH₃ • NH₃
Wet Chemical Processing
Wet processes are critical for surface prep, particle removal, and oxide etching. AsiaGas supplies semiconductor-grade liquid chemicals for front-end and back-end cleaning with low contamination risk.
- Applications: RCA cleans, native oxide removal, photoresist strip, post-CMP cleans
- Products: HF • H₂SO₄ • H₂O₂
